Recent U.S. patents related to chemical-amplification:
6,340,553: Positive-working photoresist composition
6,284,430: Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same
6,284,428: Undercoating composition for photolithographic resist
6,255,041: Method for formation of patterned resist layer
6,225,476: Positive-working photoresist composition
6,180,313: Poly (disulfonyl diazomethane) compound and positive-working chemical-amplification photoresist composition containing the same
6,177,231: Resist material and fabrication method thereof
6,171,749: Negative-working chemical-amplification photoresist composition
6,153,733: (Disulfonyl diazomethane compounds)
6,093,931: Pattern-forming method and lithographic system
6,087,063: Positive-working photoresist composition
6,042,988: Chemical-amplification-type negative resist composition
5,994,030: Pattern-forming method and lithographic system
5,985,673: Method for regeneration of a sensor
5,981,146: Resist coating film
5,787,105: Integrated semiconductor laser apparatus
5,773,192: Organic silicon compound, resist, thermal polymerization composition and photopolymerization composition
5,624,788: Organic silicon compound, resist thermal polymerization composition and photopolymerization composition
5,512,417: Positive resist composition comprising a bis (t-butoxycarbonylmethly(thymolphthalein as a dissolution inhibitor
6,383,696: Methods of forming a face plate assembly of a color display
6,383,401: Method of producing flex circuit with selectively plated gold
6,383,329: Apparatus and method for removing a label from a surface with a chilled medium
6,383,289: Apparatus for liquid carbon dioxide systems
6,381,873: Method for drying a polymer coating on a substrate
6,381,166: Semiconductor memory device having variable pitch array
6,380,611: Treatment for film surface to reduce photo footing
6,380,317: Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations
6,380,270: Photogenerated nanoporous materials
6,380,067: Method for creating partially UV transparent anti-reflective coating for semiconductors
6,379,883: Microfabricated aperture-based sensor
6,379,875: Stripper pretreatment
6,379,874: Using block copolymers as supercritical fluid developable photoresists
6,379,870: Method for determining side wall oxidation of low-k materials
6,379,869: Method of improving the etch resistance of chemically amplified photoresists by introducing silicon after patterning
6,379,865: Photoimageable, aqueous acid soluble polyimide polymers
6,379,862: Radiation-sensitive resin composition
6,379,861: Polymers and photoresist compositions comprising same
6,379,860: Positive photosensitive composition
6,379,796: Composite hollow fiber membrane
6,379,551: Method of removing metal ions using an ion exchange membrane
6,378,907: Connector apparatus and system including connector apparatus
6,376,392: PECVD process for ULSI ARL
6,376,385: Method of manufacturing assembly for plasma reaction chamber and use thereof
6,376,151: Positive resist composition
6,376,149: Methods and compositions for imaging acids in chemically amplified photoresists using pH-dependent fluorophores
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6,348,683: Quasi-optical transceiver having an antenna with time varying voltage
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