Recent U.S. patents related to Projection exposure:
6,388,736: Imaging method using phase boundary masking with modified illumination
6,388,735: Projection exposure system
6,388,734: Projection exposure apparatus
6,388,733: Exposure apparatus with an anti-vibration structure
6,388,261: Charged-particle-beam microlithography apparatus and methods exhibiting reduced astigmatisms and linear distortion
6,387,587: Positive-working chemical-amplification photoresist composition
6,387,574: Substrate for transfer mask and method for manufacturing transfer mask by use of substrate
6,387,573: Phase shift mask using CrAION as phase shifter material and manufacturing method thereof
6,385,498: Manufacturing method for microlithography apparatus
6,384,898: Projection exposure apparatus
6,383,940: Exposure method and apparatus
6,383,719: Process for enhanced lithographic imaging
6,383,718: Photomask and pattern forming method employing the same
6,383,708: Positive resist composition
6,381,004: Exposure apparatus and device manufacturing method
6,377,655: Reflective mirror for soft x-ray exposure apparatus
6,377,338: Exposure apparatus and method
6,377,337: Projection exposure apparatus
6,377,336: Projection exposure apparatus
6,377,333: Method of adjusting projection optical apparatus
6,377,332: Optical member for photolithography and photolithography apparatus
6,376,849: Charged particle beam exposure apparatus mask and charged particle beam exposure apparatus
6,376,848: Apparatus and methods for charged-particle-beam microlithography exhibiting reduced aberrations caused by beam deflection to correct errors in stage-position control
6,376,329: Semiconductor wafer alignment using backside illumination
6,376,139: Control method for exposure apparatus and control method for semiconductor manufacturing apparatus
6,376,137: Charged-particle-beam microlithography apparatus and methods including correction of stage-positioning errors using a deflector
6,376,132: Mask for electron beam exposure, manufacturing method for the same, and manufacturing method for semiconductor device
6,374,639: Silica glass and its manufacturing method
6,374,396: Correction of field effects in photolithography
6,373,554: Optical system with improved durability for projection exposure apparatus and method for manufacturing optical system for projection exposure apparatus
6,373,153: Stage device, and exposure apparatus with linear motor having polygonal shaped coil units
6,372,656: Method of producing a radiation sensor
6,372,646: Optical article, exposure apparatus or optical system using it, and process for producing it
6,372,395: Exposure method for overlaying one mask pattern on another
6,366,413: Method of straightening the supporting surfaces of supporting elements for optical elements
6,366,410: Reticular objective for microlithography-projection exposure installations
6,366,404: Projection optical system, production method thereof, and projection exposure apparatus using it
6,366,342: Drive apparatus, exposure apparatus, and method of using the same
6,362,926: Projection exposure apparatus and method
6,362,489: Charged-particle-beam microlithography methods exhibiting reduced thermal deformation of mark-defining member
6,361,911: Using a dummy frame pattern to improve CD control of VSB E-beam exposure system and the proximity effect of laser beam exposure system and Gaussian E-beam exposure system
6,359,688: Projection exposure apparatus and method of controlling same
6,359,678: Exposure apparatus, method for producing the same, and exposure method
6,356,616: Apparatus and methods for detecting position of an object along an axis
6,356,343: Mark for position detection and mark detecting method and apparatus
6,355,385: Methods for making reticle blanks, and for making reticles therefrom, for charged-particle-beam microlithography
6,355,383: Electron-beam exposure system, a mask for electron-beam exposure and a method for electron-beam exposure
6,353,470: Microlithography reduction objective and projection exposure apparatus
6,352,800: Reticle for use in exposing semiconductor, method of producing the reticle, and semiconductor device
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